Xxera/openscience/retractions

Record #16510

Stress Relaxation Mechanism in the Si-SiO2 System and Its Influence on the Interface Properties

Daniel Kropman, Viktor Seeman, Sergei Dolgov, Ivo Heinmaa, Artur Medvid

Journal

Physica Status Solidi C

Publisher

Original paper date

Jul 19, 2016

Original DOI

10.1002/pssc.201600051

Country

🇪🇪 Estonia · 🇱🇻 Latvia

Institution

Tallinn University of Technology, Tallin, Estonia · Institute of Chemical and Biophysics, Tallin, Estonia · Riga Technical University, Riga, Latvia

Open access

No

Article type

Research Article

Broad categories

(PHY) Chemistry (PHY) Engineering - Structural (PHY) Physics

Citation lifecycle

How this paper is being cited

Pre-retraction

0

Same day

0

Post-retraction

1

% post-retraction

100.0%

~0.0 citations/yr before retraction · ~0.1 citations/yr after

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