Xxera/openscience/retractions

Record #26040

Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Alireza Kazemi, Xiang He, Seyedhamidreza Alaie, Javad Ghasemi, Noel Mayur Dawson, Francesca Cavallo, Terefe G Habteyes, Steven R J Brueck, Sanjay Krishna

Journal

Scientific Reports

Publisher

Springer - Nature Publishing Group

Original paper date

Jul 1, 2015

Original DOI

10.1038/srep11463

Country

🇺🇸 United States

Institution

Center for High Technology Materials, University of New Mexico, 87106, NM, USA · Department of Mechanical Engineering, University of New Mexico, 87131, NM, USA · Nanoscience and Microsystems Engineering, University of New Mexico, 87131, NM, USA

Open access

No

Article type

Research Article

Broad categories

(PHY) Engineering - Electrical (PHY) Nanotechnology

Citation lifecycle

How this paper is being cited

Pre-retraction

22

Same day

0

Post-retraction

2

% post-retraction

8.3%

~3.9 citations/yr before retraction · ~0.4 citations/yr after

— citing papers

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